Carbon contamination of EUV mask and its effect on CD performance

Autor: Lee, Sangsul, Doh, Jong Gul, Lee, Jae Uk, Lee, Inhwan, Jeong, Chang Young, Lee, Dong Gun, Rah, Seung-yu, Ahn, Jinho
Zdroj: In Current Applied Physics 2011 11(4) Supplement:S107-S110
Databáze: ScienceDirect