Dose loss and segregation of boron and arsenic at the Si/SiO 2 interface by atomistic kinetic Monte Carlo simulations
| Autor: | Rubio, J.E., Jaraiz, M., Martin-Bragado, I., Castrillo, P., Pinacho, R., Barbolla, J. |
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| Zdroj: | In Materials Science & Engineering B 2005 124:392-396 |
| Databáze: | ScienceDirect |
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