Preparation of a novel catalyst (SoFeIII) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

Autor: Xu, Li a, b, c, ∗∗, Zhang, Xin a, Kang, Chengxi a, Wang, Rongrong a, Zou, Chunli a, b, c, Zhou, Yan a, b, c, Pan, Guoshun a, b, c, ∗
Zdroj: In Tribology International April 2018 120:99-104
Databáze: ScienceDirect