Atomic layer etching of SiO2 using trifluoroiodomethane
| Autor: | Kim, Seon Yong, Park, In-Sung, Ahn, Jinho |
|---|---|
| Zdroj: | In Applied Surface Science 1 July 2022 589 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Kim, Seon Yong, Park, In-Sung, Ahn, Jinho |
|---|---|
| Zdroj: | In Applied Surface Science 1 July 2022 589 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect