Atomic layer etching of SiO2 using trifluoroiodomethane
| Autor: | Kim, Seon Yong a, Park, In-Sung b, ⁎, Ahn, Jinho a, c, ⁎ |
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| Zdroj: | In Applied Surface Science 1 July 2022 589 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Kim, Seon Yong a, Park, In-Sung b, ⁎, Ahn, Jinho a, c, ⁎ |
|---|---|
| Zdroj: | In Applied Surface Science 1 July 2022 589 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect