The effective Work-Function of atomic layer deposited TaN thin film using TBTDET precursor and NH3 reactant gas
Autor: | Kim, Minhyuk, Choi, Moonsuk, Lee, Juhyeon, Jin, Weinan, Choi, Changhwan |
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Zdroj: | In Applied Surface Science 30 March 2022 579 |
Databáze: | ScienceDirect |
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