The effective Work-Function of atomic layer deposited TaN thin film using TBTDET precursor and NH3 reactant gas

Autor: Kim, Minhyuk, Choi, Moonsuk, Lee, Juhyeon, Jin, Weinan, Choi, Changhwan
Zdroj: In Applied Surface Science 30 March 2022 579
Databáze: ScienceDirect