Simulation and measurement of the capacitance benefit of air gap interconnects for advanced technology nodes

Autor: Kumaresan, V., Wilson, C.J., Verdonck, P., Van Besien, E., Lazzarino, F., Truffert, V., Bömmels, J., Tokei, Zs., Wong, T.K.S.
Zdroj: In Microelectronic Engineering 25 May 2014 120:90-94
Databáze: ScienceDirect