Advanced Hi-Fill ® for interconnect liner applications

Autor: Urbansky, N , Burgess, S.R, Schmidbauer, S, Heydenreich, U, Donohue, H, Moncrieff, I, Görgens, C
Zdroj: In Microelectronic Engineering 2002 64(1):99-105
Databáze: ScienceDirect