Etching kinetics and dielectric properties of SiOC films exposed to Ar and CF4 plasmas
| Autor: | Oh, Younghun, Efremov, Alexander, Lee, Junmyung, Lee, Jongchan, Choi, Yeonsik, Kwon, Kwang-Ho |
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| Zdroj: | In Thin Solid Films 1 May 2022 749 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect