Etching kinetics and dielectric properties of SiOC films exposed to Ar and CF4 plasmas
| Autor: | Oh, Younghun a, Efremov, Alexander b, Lee, Junmyung a, Lee, Jongchan a, Choi, Yeonsik a, Kwon, Kwang-Ho a, ⁎ |
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| Zdroj: | In Thin Solid Films 1 May 2022 749 |
| Databáze: | ScienceDirect |
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