Device-grade a-SiGe:H alloys prepared by nanometer deposition/H 2 plasma annealing method
| Autor: | Xu, Jun, Shiba, Kazutoshi, Miyazaki, Seiichi, Hirose, Masataka, Chen, Kunji, Feng, Duan |
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| Zdroj: | In Journal of Non-Crystalline Solids 1996 198 Part 1:582-586 |
| Databáze: | ScienceDirect |
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