Electrostically defined few-electron double quantum dot in silicon
Autor: | Lim, W. H., Huebl, H., van Beveren, L. H. Willems, Rubanov, S., Spizzirri, P. G., Angus, S. J., Clark, R. G., Dzurak, A. S. |
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Rok vydání: | 2009 |
Předmět: | |
Zdroj: | Appl. Phys. Lett. 94, 173502 (2009) |
Druh dokumentu: | Working Paper |
DOI: | 10.1063/1.3124242 |
Popis: | A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the energy spectrum of the device. The double dot structure is electrically tunable, enabling the inter-dot coupling to be adjusted over a wide range, as observed in the charge stability diagram. Resonant single-electron tunneling through ground and excited states of the double dot was clearly observed in bias spectroscopy measurements. Comment: 4 pages, 3 figures, accepted for Applied Physics Letters |
Databáze: | arXiv |
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