HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering

Autor: Renee J. Sáenz-Hernández, Paula Rebeca Realyvazquez-Guevara, A. Arteaga-Durán, María E. Botello-Zubiate, José Andrés Matutes-Aquino, Alejandro Faudoa-Arzate
Rok vydání: 2017
Předmět:
Zdroj: Materials, Vol 10, Iss 2, p 200 (2017)
Materials
Materials; Volume 10; Issue 2; Pages: 200
ISSN: 1996-1944
DOI: 10.3390/ma10020200
Popis: Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a thin film was deposited, two successive annealing treatments were made: an initial annealing at 400 °C for 6 h was followed by a second annealing at 350 °C for 1 h. Film characterization was carried out by X-ray diffraction (XRD), high-resolution electron transmission microscopy (HRTEM), scanning electron microscopy (SEM), and atomic force microscopy (AFM) techniques. The β-WO3 final phase grew in form of columnar crystals and its growth plane was determined by HRTEM.
Databáze: OpenAIRE