Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application (high resolution) or production application (high sensitivity)

Autor:	Cécile Gourgon, A. Andrei, Masumi Suetsugu, Murielle Charpin, S. Tedesco, Ryotaro Hanawa, Tadashi Kusumoto, Daniel Henry, Yves Laplanche, Laurent Pain, H. Yokoyama
Rok vydání:	2002
Předmět:	Tone (musical instrument) Materials science CMOS Resist Etching (microfabrication) Nanotechnology Sensitivity (control systems) Photoresist Lithography Electron-beam lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
Popis:	In this study, it is investigated how chemical modifications of a given resist platform can induce improvements in e-beam lithographic performances. Molecular weight (Mw) as well as photo-acid generator (PAG) modifications will act as fine tuners for Sumitomo NEB-33 negative resist to match specific applications: preparation of advanced CMOS R&D architecture (highly resolving resists needed) and fast patterning for production environment (highly sensitive resists needed).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f3c0d4b4f03d94a64132cf872d76a868 https://doi.org/10.1117/12.474193 Zobrazit plný text záznamu