Use Of Expert Systems In Photolithography

Autor:	Terry Cline, Wendy Fong
Rok vydání:	1987
Předmět:	Engineering drawing Engineering business.industry Scheduling (production processes) Rule-based system Integrated circuit computer.software_genre Automation Manufacturing engineering Expert system law.invention law Control system Process control Photolithography business computer
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.940438
Popis:	Expert systems for photolithography or photolithography-related domains are being built by many semiconductor chip manufacturers, fabrication equipment manufacturers, and university groups. This paper describes several such applications for process control, diagnosis, automation, design, simulation, planning, and scheduling. Benefits and implementation issues are highlighted.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c7f7e6e09d26dc8e24dacc4781715fa0 https://doi.org/10.1117/12.940438 Zobrazit plný text záznamu