Co-existence of Random Telegraph Noise and Single-Hole-Tunneling State in Gate-All-Around PMOS Silicon Nanowire Field-Effect-Transistors

Autor: Gyo-Young Jin, Kyoung Hwan Yeo, SeongJoo Lee, Donggun Park, Sungwoo Hwang, Dong-Won Kim, ByoungHak Hong, Keun Hwi Cho
Rok vydání: 2011
Předmět:
Zdroj: JSTS:Journal of Semiconductor Technology and Science. 11:80-87
ISSN: 1598-1657
DOI: 10.5573/jsts.2011.11.2.080
Popis: Low temperature hole transport characteristics of gate-all-around p-channel metal oxide semiconductor (PMOS) type silicon nanowire fieldeffect-transistors with the radius of 5 ㎚ and lengths of 44-46 ㎚ are presented. They show coexisting two single hole states randomly switching between each other. Analysis of Coulomb diamonds of these two switching states reveals a variety of electrostatic effects which is originated by the potential of a single hole captured in the trap near the nanowire.
Databáze: OpenAIRE