Interference nanolithography with a UV laser

Autor:	Yu K Verevkin, V N Petryakov, V. N. Burenina, V.F. Dryakhlushin, A. V. Kirsanov, N. V. Vostokov, A. Yu. Klimov, Vladimir I. Bredikhin
Rok vydání:	2004
Předmět:	Materials science Physics and Astronomy (miscellaneous) Silicon business.industry chemistry.chemical_element Substrate (electronics) Photoresist Laser Electromagnetic radiation law.invention Optics Nanolithography chemistry Interference (communication) law Optoelectronics business Indium
Zdroj:	Technical Physics. 49:1191-1195
ISSN:	1090-6525 1063-7842
DOI:	10.1134/1.1800241
Popis:	The sensitivity and resolution of a photoresist composed of a two-layer (polymer-metallic indium) film are measured. 2D masks used to create nanodimensional metallic and insulating islands on a silicon substrate are prepared by direct laser action. Conditions are found for preparing submicron periodic structures on TiO2 films that are applied on a glass substrate by the sol-gel technology. Optical properties of these arrays are measured, and it is shown that they can be used for exciting plane electromagnetic waves.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::505695405f2b9deaf3fc0df44d45928c https://doi.org/10.1134/1.1800241 Zobrazit plný text záznamu Plný text ve formátu PDF