Interference nanolithography with a UV laser
Autor: | Yu K Verevkin, V N Petryakov, V. N. Burenina, V.F. Dryakhlushin, A. V. Kirsanov, N. V. Vostokov, A. Yu. Klimov, Vladimir I. Bredikhin |
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Rok vydání: | 2004 |
Předmět: | |
Zdroj: | Technical Physics. 49:1191-1195 |
ISSN: | 1090-6525 1063-7842 |
DOI: | 10.1134/1.1800241 |
Popis: | The sensitivity and resolution of a photoresist composed of a two-layer (polymer-metallic indium) film are measured. 2D masks used to create nanodimensional metallic and insulating islands on a silicon substrate are prepared by direct laser action. Conditions are found for preparing submicron periodic structures on TiO2 films that are applied on a glass substrate by the sol-gel technology. Optical properties of these arrays are measured, and it is shown that they can be used for exciting plane electromagnetic waves. |
Databáze: | OpenAIRE |
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