Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst

Autor:	Tomohiro Shiroi, Shiro Nagaoka, Tomokazu Shikama, Hideo Horibe, Masashi Yamamoto
Rok vydání:	2019
Předmět:	Materials science chemistry Hydrogen radical Hydrogen Chemical engineering Tantalum chemistry.chemical_element Surface element Photoresist Environmentally friendly Catalysis
Zdroj:	NANOSCIENCE AND NANOTECHNOLOGY: NANO-SciTech.
ISSN:	0094-243X
DOI:	10.1063/1.5124640
Popis:	Photoresist removal method using hydrogen radicals produced by decomposing hydrogen on a hot-wire catalyst is one of an environmentally friendly methods. We examined the relationship between photoresist removal rate and its surface temperature and the surface element analysis for a tantalum catalyst. In this study, we considered an adaptability of the catalyst to the removal.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4666c47597353d15f51f381e560d9793 https://doi.org/10.1063/1.5124640 Zobrazit plný text záznamu