Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst

Autor: Tomohiro Shiroi, Shiro Nagaoka, Tomokazu Shikama, Hideo Horibe, Masashi Yamamoto
Rok vydání: 2019
Předmět:
Zdroj: NANOSCIENCE AND NANOTECHNOLOGY: NANO-SciTech.
ISSN: 0094-243X
DOI: 10.1063/1.5124640
Popis: Photoresist removal method using hydrogen radicals produced by decomposing hydrogen on a hot-wire catalyst is one of an environmentally friendly methods. We examined the relationship between photoresist removal rate and its surface temperature and the surface element analysis for a tantalum catalyst. In this study, we considered an adaptability of the catalyst to the removal.
Databáze: OpenAIRE