Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst
Autor: | Tomohiro Shiroi, Shiro Nagaoka, Tomokazu Shikama, Hideo Horibe, Masashi Yamamoto |
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Rok vydání: | 2019 |
Předmět: | |
Zdroj: | NANOSCIENCE AND NANOTECHNOLOGY: NANO-SciTech. |
ISSN: | 0094-243X |
DOI: | 10.1063/1.5124640 |
Popis: | Photoresist removal method using hydrogen radicals produced by decomposing hydrogen on a hot-wire catalyst is one of an environmentally friendly methods. We examined the relationship between photoresist removal rate and its surface temperature and the surface element analysis for a tantalum catalyst. In this study, we considered an adaptability of the catalyst to the removal. |
Databáze: | OpenAIRE |
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