| Popis: |
If a local gas ambient of 10−3 to 10−2 torr pressure of a metal halide, organometallic, or hydrocarbon gas is produced at a surface, deposition of material can be induced where ions are incident. The ion beam is thought to cause the breakup of molecules adsorbed on the surface. Deposition of a mixture of Al, C, and O has been reported(1) from a gas of Al(CH3)3 and mixture of W and O from a gas of WF6. We have used a capillary gas feed of dimethyl gold hexafluoro acetylacetonate (C7H7F6O2Au) and induced gold deposition using a focused 15kV Ga+ ion beam or broad beams of 50kV Si+ and 0.75kV Ar+. See Fig. 1. |
