Autor: |
A. Kamgar, L. E. Trimble, R.L. Field, W.S. Lindenberger, Steven James Hillenius, H.-I. Cong, George K. Celler, James C. Sturm |
Rok vydání: |
2003 |
Předmět: |
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Zdroj: |
IEEE SOS/SOI Technology Conference. |
DOI: |
10.1109/soi.1989.69804 |
Popis: |
Summary form only given. CMOS dual-modulus prescaler circuits built in very thin SIMOX films are discussed. They operate at 6.2 GHz, the highest speed ever reported for a digital CMOS circuit and 50% faster than control circuits built in bulk Si. The high speed is obtained by taking advantage of the intrinsic properties of the SOI structure combined with the symmetric CMOS technology that simultaneously optimizes the characteristics of both the p- and n-channel transistors. > |
Databáze: |
OpenAIRE |
Externí odkaz: |
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