Progress with 100 mm diameter In/sub 0.53/Ga/sub 0.47/As/InP wafer processing

Autor: A.R. Sugg, J.J. Sudol, Martin H. Ettenberg, Michael J. Lange, Gregory H. Olsen, Stephen R. Forrest, Marshall J. Cohen
Rok vydání: 2003
Předmět:
Zdroj: Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362).
DOI: 10.1109/iciprm.1999.773709
Popis: Photodetector array results for InGaAs/InP epitaxial layers grown on 50 and 75 mm diameter InP substrates are presented. Best shunt-resistance area products for lattice-matched material exceed 100,000 ohm-cm/sup 2/. X-ray topography results indicate that low defect density (
Databáze: OpenAIRE