Talbot lithography as an alternative for contact lithography for submicron features

Autor: von Freymann, Georg, Schoenfeld, Winston V., Rumpf, Raymond C., Dunbar, L. A., Nguyen, D., Timotijevic, B., Vogler, U., Veseli, S., Bergonzi, G., Angeloni, S., Bramati, A., Voelkel, R., Stanley, R. P.
Zdroj: Proceedings of SPIE; March 2014, Vol. 8974 Issue: 1 p89740F-89740F-8, 807669p
Databáze: Supplemental Index