Characterization of Ti/TiN Films and SiO2/Ti Interfaces by Use of X-Ray Photoelectron Spectroscopy.

Autor: Bernard, Joffre, Adem, Ercan, Ramaswami, Seshadri
Zdroj: MRS Online Proceedings Library; 01/21/1993, Vol. 318, pN.PAG-1, 1p
Databáze: Complementary Index