Characterization of Ti/TiN Films and SiO2/Ti Interfaces by Use of X-Ray Photoelectron Spectroscopy.
Autor: | Bernard, Joffre, Adem, Ercan, Ramaswami, Seshadri |
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Zdroj: | MRS Online Proceedings Library; 01/21/1993, Vol. 318, pN.PAG-1, 1p |
Databáze: | Complementary Index |
Externí odkaz: |