Low-pressure plasma deposition of photosensitive organosilicon polymers.
Autor: | Hagedorn, M. S., Higman, T. K., Fayfield, R. T., Chen, J. |
---|---|
Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 3, p862-864, 3p |
Databáze: | Complementary Index |
Externí odkaz: |