Low-pressure plasma deposition of photosensitive organosilicon polymers.

Autor: Hagedorn, M. S., Higman, T. K., Fayfield, R. T., Chen, J.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 3, p862-864, 3p
Databáze: Complementary Index