Development of organic bottom antireflective coating for 157-nm lithography.
| Autor: | Irie, Shigeo, Shigematsu, Masato, Miyoshi, Seiro, Sakamoto, Rikimaru, Mizusawa, Kenichi, Nakajima, Yasuyuki, Itani, Toshiro |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p1371-1377, 7p |
| Databáze: | Complementary Index |
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