Pattern decomposition for double patterning from photomask viewpoint.
| Autor: | Toyama, Nobuhito, Adachi, Takashi, Inazuki, Yuichi, Sutou, Takanori, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65210V-65210V-10, 10p |
| Databáze: | Complementary Index |
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