High-resolution 157-nm imaging for lithography and micromachining applications.
Autor: | Gower, Malcolm C., Cashmore, Julian S., Whitfield, Michael D., Gruenewald, Philipp |
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Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p401-407, 7p |
Databáze: | Complementary Index |
Externí odkaz: |