High-resolution 157-nm imaging for lithography and micromachining applications.
| Autor: | Gower, Malcolm C., Cashmore, Julian S., Whitfield, Michael D., Gruenewald, Philipp |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p401-407, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|