Low Resistivity Boron Doped Amorphous Silicon-Germanium Alloy Films Obtained with a Low Frequency Plasma.
Autor: | Heredia-J, A., Tones-J, A., De la Hidalga-W, F.J., Jaramillo-N, A., Sancnez-M, J., Zúñiga-I, C., Basurto P, M., Pérez, A. |
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Zdroj: | MRS Online Proceedings Library; Dec2003, Vol. 796 Issue 1, p56-61, 6p |
Databáze: | Complementary Index |
Externí odkaz: |