Low Resistivity Boron Doped Amorphous Silicon-Germanium Alloy Films Obtained with a Low Frequency Plasma.

Autor: Heredia-J, A., Tones-J, A., De la Hidalga-W, F.J., Jaramillo-N, A., Sancnez-M, J., Zúñiga-I, C., Basurto P, M., Pérez, A.
Zdroj: MRS Online Proceedings Library; Dec2003, Vol. 796 Issue 1, p56-61, 6p
Databáze: Complementary Index