Solution processable high quality ZrO2 dielectric films for low operation voltage and flexible organic thin film transistor applications.
Autor: | Yanfen Gong, Kai Zhao, Huixin He, Wei Cai, Naiwei Tang, Honglong Ning, Sujuan Wu, Jinwei Gao, Guofu Zhou, Xubing Lu, J-M Liu |
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Předmět: | |
Zdroj: | Journal of Physics D: Applied Physics; 3/21/2018, Vol. 51 Issue 11, p1-1, 1p |
Abstrakt: | Low temperature fabrication of high quality dielectric films for high performance flexible electronics is still a big challenge. In this work, we realized low temperature fabrication of high quality amorphous ZrO |
Databáze: | Complementary Index |
Externí odkaz: |
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