Low-loss Ta2O5/SiO2 planar waveguides on quartz substrate
| Autor: | Zi-Qi Lin, 林子淇 |
|---|---|
| Rok vydání: | 2019 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 107 In the thesis, single mode Ta2O5/SiO2 planar optical waveguides were fabricated and characterized. The 80nm-thick Ta2O5 core were formed by reactive of-sputtering on a quartz wafer. Then the 2.0μm wide Ta2O5 core was formed by CHF3 plasma etching. The device was completed by depositing 2μm thick sputtered oxide at the top cladding. The material system of the waveguide was also characterized by ellipsometry technique. The refractive index and extinction coefficient of the Ta2O5 core are 2.1 and 0 at a measured wavelength of 1.55μm. However, the extinction coefficient of oxide cladding changed drastically with the sputtering conditions. At a oxygen partial pressure of 70%, the extinction coefficient of the oxide film as low as 0.000009 was obtained, as compared to 0.000372 of the film deposited at zero oxy gun partial pressure. Finally, the loss characteristics of the Ta2O5 planar waveguide were measured by cut-back method. The propagation loss and the coupling loss of the waveguide are 2.4 dB/cm and 3.04dB/cm, 36.53dB and 35.32 dB respectively. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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