A diffraction maskless lithography system that uses the Fourier transform domain
| Autor: | Hsu, Chia-Ling, 許嘉玲 |
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| Rok vydání: | 2018 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 107 This thesis discusses a diffraction maskless lithography system that uses the Fourier transform domain. The unique characteristic of such a system is that it uses a Fourier transform of the square aperture to produce an incident light distributing Sinc function at the input of the SLM. In addition, a light field distributing Rect function is produced at the exposure plane. Lastly, a high quality exposure image is designed and simulated at the light field of the exposure plane by the IFTA algorithm. The diffraction maskless system discussed in this thesis can produce an exposure image with high uniformity and contrast. The exposure image fits into the imaging characteristics of phase-shifting mask technology. By applying this system, a photoresist image with high uniformity and contrast can be produced. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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