A Study on the Preparation of a Surface Modification Layer with Surface Hydrophobicity and Oleophobicity on Various Substrate
Autor: | XU, ZHENG-WEN, 許政文 |
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Rok vydání: | 2018 |
Druh dokumentu: | 學位論文 ; thesis |
Popis: | 106 First, a silver thin film (~32 nm) was deposited on the silicon, glass, sapphire substrate using an RF magnetron co-sputtering system at a power of 15 watts. Using a rapid thermal annealing, under a nitrogen atmosphere and a vacuum atmosphere, annealing was continued for 1 minute at different heat treatment temperatures of 200, 300, 400, and 500°C, respectively. Plasma-Enhanced Chemical Vapor Deposition (PECVD) was used to deposit Organosilicon hydrophobic thin films (~100 nm). Measure the effect of the film on the water drop angles on different substrates and find the optimal parameters. Finally, the surface of the Organosilicon thin film is etched by PECVD dry Tetrafluoromethane (CF 4 ), which makes the surface more hydrophobic-oleophobic. It is expected to have oil-resistant and self-cleaning effects on different substrates. The results show that the silver films deposited on the silicon, glass, and sapphire substrates are all different. According to the literature, due to the mismatch between the crystal lattice of the substrate and the silver film, and the difference in the thermal expansion coefficient between the substrate and the silver film, different morphologies will appear after deposition and annealing. However, annealing enhances the roughness of silver particles on the silicon, glass, and sapphire substrates in a vacuum atmosphere. This also led to subsequent dry etching, which enhanced the hydrophobic-oleophobic properties. |
Databáze: | Networked Digital Library of Theses & Dissertations |
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