Analysis of the main components of a photoresist stripper in optoelectronic and semiconductor manufacturing process
| Autor: | HUANG,CHUN-CHENG, 黃俊程 |
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| Rok vydání: | 2018 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 106 Near-infrared spectroscopy has been widely used in the detection and analysis of agricultural products in recent years. Due to its fast and non-destructive nature, near-infrared spectroscopy has the potential to be an online analytical monitoring tool and indeed it has been used in etch fluid monitoring and analysis in recent years. Like etchant, photoresist stripper is an important chemical widely used in the array process of semiconductor industry and optoelectronic industry. Upon the finish of each etching step, photoresist stripper is employed to remove photoresist to reveal metal circuits and semiconductor patterns. In photoresist removal process, the operating conditions that affect product yield include reaction surroundings, chemical composition of stripper, and contact time. In order to minimize the consumption of chemicals and reduce discharge of waste liquid, the reuse of photoresist stripper has become a common operation in industry. Therefore, dynamically monitoring and adjusting the chemical composition of recycled stripper within a normal range is crucial to maintain and furthermore to improve production yield. The objective of this study is to establish an analytical method for the chemical composition of ethanolamine and dimethyl sulfoxide based photoresist stripper using Fourier transform near-infrared spectroscopy. The chemical compositions obtained from Fourier transform near-infrared spectroscopy were compared with those determined by high-performance liquid chromatography and gas chromatography. The feasibility of using Fourier transform near-infrared spectroscopy to monitor the chemical composition of the photoresist stripping solution online was discussed. In this study, simulated photoresist strippers with an ethanolamine concentration range of 40 to 90% and a dimethyl sulfoxide concentration range of 10 to 60% were used as the training samples, and partial least square regression was adopted in Fourier transform near-infrared spectroscopy to establish analytical model. Subsequently, the model was validated with commercial photoresist stripper TOK 106 and several simulated samples. The results showed that the concentrations of ethanolamine and dimethyl sulfoxide determined by Fourier transform near-infrared spectroscopy were similar to those analyzed by high-performance liquid chromatography and gas chromatography. The compositions of a series of TOK 106 samples taken from several production lines at different time were analyzed using these three analysis methods. The results of these three methods showed coherent trends in the concentrations of ethanolamine and dimethyl sulfoxide. This proves that near-infrared spectroscopy has the potential to serve as an on-line monitoring tool for chemical composition of ethanolamine and dimethyl sulfoxide based photoresist strippers. Keywords: photoresist stripper, ethanolamine, dimethyl sulfoxide, near-infrared spectroscopy, liquid chromatography, gas chromatography |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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