Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment
| Autor: | Chen, Pin Hsuan, 陳品璇 |
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| Rok vydání: | 2017 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 105 |
| Databáze: | Networked Digital Library of Theses & Dissertations |
| Externí odkaz: |
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