Investigate the characteristic of HTO germanium ferroelectric capacitor under the interface modification and different process conditions
| Autor: | Fan, Ching-Chun, 范景淳 |
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| Rok vydání: | 2017 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 105 Since the invention of silicon integration circuit, the semiconductor process have scaled down the gate length with the path of the Moore’s law to get better performance, lower power consumption, more functions and cheaper chips. With the scaling down process evolving into the sub-micron reign, in order to make characteristic of transistor more prominently, the semiconductor industry developed many kinds of material to replace the old parts of the transistor, such as silicide which changes a silicide material to a novel silicide material, strained-silicon which replaces silicon in the source/drain region with SiC or SiGe which can apply the force to the channel, and high- material, hafnium oxide for instance, to replace the silicon dioxide insulator, and metal gate to replace the poly-silicon gate. Meanwhile, it is more popular that the research of semiconductor atom, germanium, as the channel of transistor. The bad interface property of germanium and instability of germanium dioxide, however, are the key obstacles for researchers to attain the outstanding germanium transistor. In this thesis, germanium was our research material to fabricate the capacitor with better electronic characteristic because of its higher electron and hole mobility than silicon’s counterparts. To gratify well and stable germanium interface, we have executed three interface modification procedures with different processes such as changing time or temperature of post-deposition annealing, different HfTaO (HTO) thickness and rapid thermal annealing to improve the interface characteristic between germanium and HfTaO and lower the density of interface defect, and block the diffusion of GeO2. With these processes, germanium capacitor with HfTaO can have high capacitance and even ferroelectric property. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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