Characterizations of CuCl films fabricated by chemical bath deposition
| Autor: | Jung-Chen Lin, 林榮晟 |
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| Rok vydání: | 2017 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 105 Copper (I) chloride (CuCl) is a kind of copper chloride, which is a broad band gap (3.399eV) I-VII compound semiconductor. CuCl has a prominent exciton binding energy of 190 meV, which makes CuCl considerable potential for the development of UV / Blue light-emitting devices. In this paper, CuCl films were deposited on copper substrate by chemical bath deposition using copper chloride and sodium chloride solution, and compared with the CuCl films deposited using only the copper chloride solution. The results show that the characteristics of CuCl films deposited by chemical bath deposition are very good. The characteristics of the CuCl film deposited by adding sodium choride solution are better than those of the film deposited without sodium chloride solution, and the proportion of Cl atoms in CuCl films can be improved. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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