The Study of Low Temperature Glass Phosphors Fabrication.
| Autor: | Shun-yuan Huang, 黃順源 |
|---|---|
| Rok vydání: | 2016 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 104 In this study, using a variety of low-temperature process for producing light-emitting diode in color conversion layer, and using high thermal reliability of the glass material as the material of the color conversion layer of silicone encapsulated, nowadays the temperature of the glass manufacturing process frequently up to 700-800oC. If towards to highly transmittance higher process temperature is above to 1000oC. Separately in the production of glass color phosphor layer is required to convert the light emitting diode packaging production line, due to the current light-emitting diode packaging material heat resistance temperature of about 200oC, lead glass color conversion layer must be used in other ways (for example, use part to connect) to secure it to the light-emitting diodes. Laser-induced crystallization of the glass-ceramic, glass by CO2 laser (10.6um) after heat treatment has generated into a crystal glass ceramic, crystal glass and crystal formation to produce a composite material after heat treatment. Glass ceramic doped with transition metals or rare earth elements, producing a fluorescent properties of glass ceramics. We excite crystal to generate white light by Blue-ray (460nm), and laser-induced heat treatment without maintain the glass at a high temperature, it can be made to induce crystallization glass at room temperature, and also significantly reduce the heat treatment time, but avoid infringement of Japan phosphor the patent, to the white light source technology. Processing SiO2 glass by sol-gel method (TEOS) at low temperature preparation. Secondary heat treatment using the method of low-temperature Sol-Gel method to enhance the thermal stability of the glass can be prepared SiO2 glass paste having a high visible light has excellent optical characteristics (approximately 90%), SiO2 glass gel has heat resistance at above high temperature 250℃ (optical characteristics are superior to traditional silicone materials 40%), SiO2 glass gel is processed at low temperature 300oC (high temperature glass material process temperature 675oC). Using (MTES-DMDES) was prepared having a high transmittance (UV-visible about 90%), high temperature is above 250oC heat resistance (better than 40% the optical properties of the traditional silicone material), the material process simply, temperature of process is lower 150oC, and densification of the good (can be isolated from oxygen and water vapor) has a sealing effect is more effective protection of the wafer. |
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