Liquid Phase Deposition Graphene TCFs: Optimization, Limitation and Innovation
| Autor: | Wei-LunChiu, 邱偉倫 |
|---|---|
| Rok vydání: | 2016 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 104 Recently, Transparent Conductive Film (TCF) has obtained tremendous attension since it plays an essntial role on both comsumable electronics and energy-related industry. With the request of modification on portable devices and the shortage of main ingredient, ITO, innovation of TCF and replacement for ITO become the first priority in the related research field. Currently, metal nanowire (NW), carbon nano tube (CNT) and graphene stand at the prior position in the campaign. Providing that we take other factors, such as strength and environmental durability into consideration, graphene will be the most appropriate option to fabriacte TCF. Because the optical and elecronical properties of graphene still fail to compete with the other two candidate, to improve the performance of graphene is going to be the biggest goal for us. We first take adevatage of solution depostion, which is relatively efffcient process comparing to Chemical Vapor Deposition (CVD) to fabricate TCF and find the limitaion of printed graphene TCF. In order to surpass the limit of graphene TCF, we here suggest a new process which can reduece the coverage of graphene in the meanwhile keep low resistance. By this process, we expect the Figure of Merit can be enhanced drastically and we hope it can make graphene the stongest candidate in the fabrication of TCF. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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