The Deposition of SiOx Films on Glasses for Super- Hydrophobicity and High Transmittance by Atmospheric Pressure Plasma Jet
| Autor: | Kung, Li-Hsuan, 龔立軒 |
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| Rok vydání: | 2016 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 104 In this study, the deposition of SiOx film on glass has been made by the Atmospheric Pressure Plasma Jet (APPJ) with Controlled Evaporator Mixer System (CEM) using (Hexamethyldisilazane, HMDSN) as precursor and controlling by read-out control devices. Tests with various combination of the process parameters, such as precursor flow rate, carrier gas flow rate, substrate moving speed, nozzle distance, substrate temperature, annealing temperature had been performed to study its effects on SiOx films properties. In this study, water contact angle, UV/Visible Spectroscopy, Atmospheric Force Microscopy (AFM), Field Emission Scanning Electron Microscope (FE-SEM), X-Ray Diffractometer (XRD) and Fourier Transform Infrared spectrometer (FTIR) had been used to examine and analyze the effects of various experimental parameters on water contact angles on the thin film. This study found that without annealing treatment the optimal water contact angle is 155°with the transmittance of 48% (500 nm) and when the thin films with standard parameters after annealing treatment, the water contact angle is 160°with the transmittance of 83% (500 nm). |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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