Using Metal-assisted Chemical Etching to Enhance the Performance of Silicon Nanopillar Solar Cells
| Autor: | Chia-Chen Chiu, 邱嘉辰 |
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| Rok vydání: | 2015 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 103 In this study we adopted p-type silicon wafers as substrates and used semiconductor technology of lithography and plasma dry etching to produce three different sizes of array structures on the silicon substrate. These array structures were doped with phosphorus to form p-n junction on the surface by ion implantation; the implantation dosage was fixed and the values of implantation energy were varied to seek a suitable parameter for device performance. An aluminum coating was prepared by sputtering as a backside electrode, and silver paste was used as the front side electrode. The performances of array devices were evaluated by a sun light simulator under AM1.5 condition. In the second part of this thesis, we developed a metal-assisted chemical etching to create nanostructures on these array structures, which increased the absorption by lower surface reflection to enhance the photoelectric conversion efficiency of solar cells. Analyses by field emission electron microscopy, total reflectance measurement, and the photoelectric conversion efficiency were carried out in these two parts. The results showed that the in the first part, for three columnar structures with 400, 1000, and 5000 nm, the photoelectric conversion efficiency were 11.33%, 10.35%, 9.36%, respectively, and a columnar array structure with 400 nm feature can be significantly increased 35.85%; in the second part of the wet etching, the result shows that the efficiency of 5000-nm device was improved 5.75% after etching, and for 1000-nm array the efficiency was increased 6.1%. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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