A study of optical alignment for super long working distance and nanometer resolution of laser interferometer
| Autor: | Yi-Hao Shih, 施益豪 |
|---|---|
| Rok vydání: | 2014 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 102 The purpose of this study was to investigate the nanometer resolution laser interferometric optical light path alignment problems. Laser interferometer position measurement method with high precision and a working distance of up to tens of meters. Currently in the semiconductor industry, LCD manufacturing process related devices the most sophisticated devices are using the laser exposure machine positioning. Research on laser positioning system, in order to provide better positioning precision displacement, this paper designed a new laser interferometric optical light path calibration mode, quickly reached superior alignment accuracy, and improve acceleration time replacement parts, originally positioned in question laser head group on the local device, the machine table adjustment, it will take 8 to 10 hours, thus positioning system platform by tuned laser head group, the replacement time can be reduced to 1 to 2 hours, to accelerate the manufacturing capacity improved, and greatly reduce repair time, this platform can be applied on any challenging long working distance nanometer resolution positioning process equipment use. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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