The Study on Aluminum Oxide Thin Film by Liquid Phase Deposition
| Autor: | Jian-Zhi HUANG, 黃建誌 |
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| Rok vydání: | 2013 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 101 In this study, aluminum oxide films were deposited on silicon wafer by liquid phase deposition with deposition solution aluminum sulfate and sodium bicarbonate. The pH value was controlled during the deposition. The deposition temperature and annealing condition were varied to improve the quality of aluminum oxide film. According to the results, all aluminum oxide films were amorphous phase. The optimum condition of deposition pH value and temperature were 3.80 and 40 oC, respectively. The better stoichiometry of aluminum oxide film can be obtained after annealing at 700 oC in nitrogen. The reflectance at the wavelength of 630 nm was 21.5 %. The surface roughness was 1.01 nm. The refractive index was 1.53 with the uniformity of 2.3%. Keywords: Liquid Phase Deposition、aluminum oxide、pH value |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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