Fabrication, self-assembly arrangement and application of polystyrene micro/nano spheres
| Autor: | Hsu-Kang Wu, 吳旭剛 |
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| Rok vydání: | 2013 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 101 Colloidal lithography is one of the developing lithography techniques for the precision pattern definition without the limitation of optical diffraction. This study developed the fabrication, self-assembly arrangement and etching of polystyrene micro/nano spheres. The emulsion polymerization and dispersion polymerization were introduced to prepare nano, sub-micron and micro particle of polystyrene spheres (PS), respectively. Then using of the self-assembly arrangement to build the hexagonal close-packed sub-micron and micron spheres on the silicon substrate. Finally, three sizes of PS spheres, 450 nm, 550 nm and 700 nm, were used as etching masks in two-step etching process approach to fabricate periodical subwavelength pyramidal structure. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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